Internship offer 2027  Study of gate oxide used in the fabrication of  diamond MOS Transistors

Internship offer 2027 Study of gate oxide used in the fabrication of diamond MOS Transistors

DIAMFAB, a startup created in 2019 after 30 years of research at the Institut Néel - CNRS Grenoble France

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Profile The intern should be preparing a 5-year degree (Master 2, engineering school) in nano-sciences, nano technologies, semiconductor technologies, electrical engineering or related fields. Experience in a Cleanroom environment would be an asset. Motivation, organization and rigor are the qualities we are looking for, as is the ability to fit into a young, dynamic team. Where and when? Where: Our pilot line is located in Fontaine, and cleanroom operations are carried out at Nanofab (CNRS – Institut Néel site). When: Start in February 2027 application Applications (resume and cover letter) should be sent to damien.michez@diamfab.com or joinus@diamfab.Com

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