Internship offer 2027 Study of gate oxide used in the fabrication of diamond MOS Transistors
DIAMFAB, a startup created in 2019 after 30 years of research at the Institut Néel - CNRS Grenoble
France
Details
Profile
The intern should be preparing a 5-year degree (Master 2, engineering school) in nano-sciences, nano
technologies, semiconductor technologies, electrical engineering or related fields. Experience in a
Cleanroom environment would be an asset. Motivation, organization and rigor are the qualities we are
looking for, as is the ability to fit into a young, dynamic team.
Where and when?
Where: Our pilot line is located in Fontaine, and cleanroom operations are carried out at
Nanofab (CNRS – Institut Néel site).
When: Start in February 2027
application
Applications (resume and cover letter) should be sent to damien.michez@diamfab.com or
joinus@diamfab.Com
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